|Title:||Surface relief gratings in self-developing photopolymer films||Authors:||Beaulieu, René
Lessard, Roger A.
|Language:||en||Subject (DDC):||DDC::500 Naturwissenschaften und Mathematik||Issue Date:||Dec-1998||Editors:||Trout, T. John||Publisher:||SPIE||Document Type:||Conference Object||Journal / Series / Working Paper (HSU):||Proceedings of SPIE - The International Society for Optical Engineering||Volume:||3294||Pages:||7 S.||Publisher Place:||Bellingham, WA||Conference:||Photonics West '98 Electronic Imaging 1998||Abstract:||
Dichromated poly(acrylic acid) (DCPAA) films with dimethyl formamide (DMF) have been used to photofabricate surface relief gratings. The formation of those gratings depends on the self-development time in darkness subsequent to the illumination at a wavelength of 442 nm and is obtained without any chemical treatment or wet processing. The modulation depth of those holographic surface relief gratings and the spatial frequency response of the thin DCPAA-DMF films have been chosen to characterize that self-developing photopolymer system. Those holographic Characteristics are presented in this paper.
|Organization Units (connected with the publication):||Universität Osnabrück||URL:||https://api.elsevier.com/content/abstract/scopus_id/0032388004||ISSN:||0277786X||DOI:||10.1117/12.304515|
|Appears in Collections:||Publications of the HSU Researchers (before HSU)|
Show full item record
checked on May 19, 2022
Items in openHSU are protected by copyright, with all rights reserved, unless otherwise indicated.