|Title:||Self-developing photopolymer system with ultraviolet sensitivity||Authors:||Kip, Detlef
Beaulieu, René M.
Lessard, Roger A.
|Language:||en||Subject (DDC):||DDC::500 Naturwissenschaften und Mathematik||Issue Date:||Dec-1997||Editors:||Frank, Werner F.||Publisher:||SPIE||Document Type:||Conference Object||Journal / Series / Working Paper (HSU):||Proceedings of SPIE - The International Society for Optical Engineering||Volume:||3135||Pages:||7 S.||Publisher Place:||Bellingham, WA||Conference:||Optical Science, Engineering and Instrumentation '97, 1997||Abstract:||
Dichromated poly(acrylic acid) films with dimethyl formamide have been investigated as UV photosensitive recording medium for the fabrication of diffractive optical elements. Surface relief structures with large depth modulation have ben formed on these films. Relief depth of surface gratings as a function of exposure time and the spatial frequency of the gratings are presented. Atomic force microscopy 3D views of surface relief gratings are also presented. ©2004 Copyright SPIE - The International Society for Optical Engineering.
|Organization Units (connected with the publication):||Universität Osnabrück||URL:||https://api.elsevier.com/content/abstract/scopus_id/0344574428||ISSN:||0277786X||DOI:||10.1117/12.279148|
|Appears in Collections:||Publications of the HSU Researchers (before HSU)|
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