DC FieldValueLanguage
dc.contributor.authorKriegel, Herman-
dc.contributor.authorKollmann, J.-
dc.contributor.authorRaudsepp, Ragle-
dc.contributor.authorKlassen, Thomas-
dc.contributor.authorSchieda, Mauricio-
dc.date.accessioned2021-04-06T14:18:53Z-
dc.date.available2021-04-06T14:18:53Z-
dc.date.issued2020-
dc.identifier.citationEnthalten in: Journal of materials chemistry. - London [u.a.] : RSC, 2013. - Online-Ressource . - Bd. 8.2020, 35, Seite 18173-18179de_DE
dc.descriptionLondonde_DE
dc.description.sponsorshipWerkstoffkundede_DE
dc.language.isoengde_DE
dc.relation.ispartofJournal of materials chemistry Ade_DE
dc.titleChemical and photoelectrochemical instability of amorphous TiO2 layers quantified by spectroscopic ellipsometryde_DE
dc.typeArticlede_DE
dc.identifier.doi10.1039/D0TA04878J-
dcterms.bibliographicCitation.volume8de_DE
dcterms.bibliographicCitation.issue35de_DE
dcterms.bibliographicCitation.pagestart18173de_DE
dcterms.bibliographicCitation.pageend18179de_DE
local.submission.typeonly-metadatade_DE
dc.description.peerReviewed-
dc.type.articleScientific Articlede_DE
hsu.opac.importopac-2020-
hsu.identifier.ppn1733476563-
item.grantfulltextnone-
item.languageiso639-1en-
item.fulltextNo Fulltext-
item.fulltext_sNo Fulltext-
item.openairetypeArticle-
crisitem.author.deptWerkstoffkunde-
crisitem.author.orcid0000-0002-9521-3273-
crisitem.author.parentorgFakultät für Maschinenbau und Bauingenieurwesen-
Appears in Collections:3 - Reported Publications
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