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  5. 3D computation of oxygen transport in Czochralski crystal growth of silicon considering evaporation
 
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3D computation of oxygen transport in Czochralski crystal growth of silicon considering evaporation

Publication date
2007
Document type
Research article
Author
Raufeisen, Alexander
Jana, Soumen
Breuer, Michael 
Botsch, Tilmann W.
Durst, Franz
Organisational unit
Universität Erlangen-Nürnberg
DOI
10.1016/j.jcrysgro.2006.11.349
URI
https://openhsu.ub.hsu-hh.de/handle/10.24405/9151
Scopus ID
2-s2.0-34147120723
ISSN
0022-0248
Series or journal
Journal of Crystal Growth
Periodical volume
303
Periodical issue
1
First page
146
Last page
149
Part of the university bibliography
Nein
  • Additional Information
Abstract
For Czochralski (Cz) growth of silicon single crystals, 3D unsteady simulations of the oxygen transport in the turbulent melt flow were conducted using a new formulation for the evaporation at the free surface found by Sakai et al. [Electrochem. Solid-State Lett. 5 (8) (2002) G72]. Compared with 2D results from literature, the computed oxygen concentration now fits the experimental data better, showing lower values in the critical region beneath the crystal than in previous simulations, which mostly arises from the more accurate prediction of the flow field. Further computations of Cz configurations show how the oxygen distribution can be influenced by rotation of the crucible and crystal. © 2007 Elsevier B.V. All rights reserved.
Cite as
In: Journal of crystal growth. - Amsterdam [u.a.] : Elsevier, ISSN 0022-0248, ZDB-ID 3043-0 - Bd. 303.2007, 1, S. 146-149, insges. 4 S.
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