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  5. MHz-repetition rate femtosecond laser assisted selective etching of microchannels in lithium tantalate

MHz-repetition rate femtosecond laser assisted selective etching of microchannels in lithium tantalate

Publication date
2025-10-14
Document type
Konferenzbeitrag
Author
Hasse, Kore  
Müller, Stella
Nwatu, Daniel Tochi  
Suntsov, Sergiy  
Kip, Detlef  
Organisational unit
Experimentalphysik und Materialwissenschaften  
URI
https://openhsu.ub.hsu-hh.de/handle/10.24405/21692
Scopus ID
2-s2.0-105021463524
Conference
Conference on Lasers and Electro-Optics (CLEO) 2025 ; Long Beach, CA, USA ; May 4-9, 2025
Publisher
IEEE
Book title
CLEO : technical conference: 4-9 May 2025, Long Beach, CA, USA / IEEE ECP, APS Division of Laser Sciene - DLS, IEEE Photonics Society, OPTICA (formerly OSA)
ISBN
978-1-957171-50-0
Article ID
4236781
Peer-reviewed
✅
Part of the university bibliography
✅
Additional Information
Language
English
Abstract
Femtosecond laser assisted selective etching of up to 2.5mm long microchannels in LiTaO₃ was investigated quantitatively concerning etching progress on time and selectivity. Influence of fs laser repetition rate and writing speed were studied.
Version
Published version
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