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  5. Self-developing photopolymer system with ultraviolet sensitivity
 
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Self-developing photopolymer system with ultraviolet sensitivity

Publication date
1997-12
Document type
Conference paper
Author
Kip, Detlef 
Glabasnia, Lutz
Beaulieu, René M.
Lessard, Roger A.
Bolte, Michèl
Editor
Frank, Werner F.
Organisational unit
Universität Osnabrück
DOI
10.1117/12.279148
URI
https://openhsu.ub.hsu-hh.de/handle/10.24405/14111
Scopus ID
2-s2.0-0344574428
ISSN
0277-786X
Conference
Optical Science, Engineering and Instrumentation '97, 1997
Series or journal
Proceedings of SPIE - The International Society for Optical Engineering
Periodical volume
3135
Part of the university bibliography
Nein
  • Additional Information
Abstract
Dichromated poly(acrylic acid) films with dimethyl formamide have been investigated as UV photosensitive recording medium for the fabrication of diffractive optical elements. Surface relief structures with large depth modulation have ben formed on these films. Relief depth of surface gratings as a function of exposure time and the spatial frequency of the gratings are presented. Atomic force microscopy 3D views of surface relief gratings are also presented. ©2004 Copyright SPIE - The International Society for Optical Engineering.
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