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Semantic modeling for collaboration and cooperation of systems in the production domain

Publication date
2018
Document type
Conference paper
Author
Hildebrandt, Constantin
Scholz, André
Fay, Alexander 
Schröder, Tizian
Hadlich, Thomas
Diedrich, Christian
Dubovy, Martin
Eck, Christian
Wiegand, Ralf
Organisational unit
Automatisierungstechnik 
DOI
10.1109/ETFA.2017.8247585
URI
https://openhsu.ub.hsu-hh.de/handle/10.24405/5950
Conference
22nd International Conference on Emerging Technologies and Factory Automation (ETFA) 2017
Book title
22nd IEEE International Conference on Emerging Technologies and Factory Automation (ETFA), Limassol, Cyprus, 12.-15. Sept. 2017
Peer-reviewed
✅
Part of the university bibliography
✅
  • Additional Information
Abstract
Cooperation and collaboration of technical systems in different application contexts is one of the main targets of the vision of “Industrie 4.0” (I40). In order to bring this vision to industrial practice, it is necessary to define a semantic basis for information exchange between systems. This paper provides the results of a project that focused on semantic modeling based on standards relevant in the I40 context. Particularly, a meta model for modeling mechatronic systems as well as a meta model for modeling the systems characteristics is provided. The combination of the two developed meta models can be used for implementation in semantic technologies, i.e. Web Ontology Language, or AutomationML. Furthermore, a use-case is introduced that shows an implementation of the meta models in AutomationML with the use of ecl@ss properties in the engineering and operation of a discrete manufacturing system.
Description
2017 22nd IEEE International Conference on Emerging Technologies and Factory Automation / IEEE International Conference on Emerging Technologies and Factory Automation 22.
Cite as
Enthalten in: 2017 22nd IEEE International Conference on Emerging Technologies and Factory Automation / IEEE International Conference on Emerging Technologies and Factory Automation 22.. - [Piscataway, NJ] : IEEE, c2017. - 2018, insges. 8 S.
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