Publication:
Influence of diluted acid mixtures on selective etching of MHz- A nd kHz-fs-laser inscribed structures in YAG

cris.virtual.departmentExperimentalphysik und Materialwissenschaften
cris.virtual.departmentExperimentalphysik und Materialwissenschaften
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.departmentbrowseExperimentalphysik und Materialwissenschaften
cris.virtual.departmentbrowseExperimentalphysik und Materialwissenschaften
cris.virtual.departmentbrowseExperimentalphysik und Materialwissenschaften
cris.virtual.departmentbrowseExperimentalphysik und Materialwissenschaften
cris.virtualsource.departmentd6e51760-3db3-4f73-b6e0-a1ffbb9b68f0
cris.virtualsource.departmente25ab10e-f014-405b-ae9d-5dfa5939c704
cris.virtualsource.department#PLACEHOLDER_PARENT_METADATA_VALUE#
dc.contributor.authorHasse, Kore Yunxin
dc.contributor.authorKip, Detlef
dc.contributor.authorKränkel, Christian
dc.date.issued2021
dc.description.abstractWe show that the inscription velocity of fs-laser written structures in YAG crystals can be significantly improved by the use of MHz repetition rates for the writing process. Using a 10 MHz inscription laser, record high writing velocities up to 100 mm/s are achieved. Also, the selective etching process is accelerated using a diluted mixture of 22% H3PO4and 24% H2SO4. The diluted mixture enables selective etching of up to 9.6 mm long, 1 μm wide and 18 μm high microchannels in 23 days. The etching parameter D of 11.2 μm2/s is a factor of 3 higher than previously reported and the selectivity is even increased by an order of magnitude. c 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement.
dc.description.versionNA
dc.identifier.doi10.1364/OME.423931
dc.identifier.issn2159-3930
dc.identifier.issn2159-3930
dc.identifier.scopus2-s2.0-85105525604
dc.identifier.urihttps://openhsu.ub.hsu-hh.de/handle/10.24405/13969
dc.language.isoen
dc.publisherOSA
dc.relation.journalOptical materials express
dc.relation.orgunitExperimentalphysik und Materialwissenschaften
dc.rights.accessRightsmetadata only access
dc.titleInfluence of diluted acid mixtures on selective etching of MHz- A nd kHz-fs-laser inscribed structures in YAG
dc.typeResearch article
dcterms.bibliographicCitation.originalpublisherplaceWashington, DC
dspace.entity.typePublication
hsu.uniBibliography
oaire.citation.endPage1554
oaire.citation.issue5
oaire.citation.startPage1546
oaire.citation.volume11
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