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  5. High-temperature diffusion doping of thin-film lithium niobate

High-temperature diffusion doping of thin-film lithium niobate

Publication date
2025-09-22
Document type
Konferenzbeitrag
Author
Schnippering, Sonja  
Hasse, Kore  
Suntsov, Sergiy  
Kip, Detlef  
Organisational unit
Experimentalphysik und Materialwissenschaften  
DOI
10.1051/epjconf/202533508008
URI
https://openhsu.ub.hsu-hh.de/handle/10.24405/21658
Conference
13th Annual Meeting of the European Optical Society (EOSAM 2025) ; Delft, The Netherlands ; August 24–28, 2025
Publisher
EDP Sciences
Series or journal
EPJ Web of Conferences
ISSN
2100-014X
Periodical volume
335
Article ID
08008
Peer-reviewed
✅
Part of the university bibliography
✅
Additional Information
Language
English
Abstract
Surface-doping of lithium niobate wafers with rare earth or optically damage-resistant ions by physical vapour deposition and high-temperature in-diffusion is a cost-efficient and flexible method for the fabrication of thin-film LN or LNOI with dopants which are not common in crystal growth. LNOI doped with Er, Yb, Tm, Pr, Zn and Zr have been fabricated with different concentrations. As an example, the fluorescence spectra of Er:Yb:LNOI samples were recorded, and a small-signal net gain of 3.7 dB/cm was measured in ridge waveguides.
Description
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0 (https://creativecommons.org/licenses/by/4.0/).
Version
Published version
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