Surface relief gratings in self-developing photopolymer films
Publication date
1998-12
Document type
Meeting abstract
Author
Editor
Trout, T. John
Organisational unit
Universität Osnabrück
Scopus ID
ISSN
Conference
Photonics West '98 Electronic Imaging 1998
Series or journal
Proceedings of SPIE - The International Society for Optical Engineering
Periodical volume
3294
Part of the university bibliography
Nein
Abstract
Dichromated poly(acrylic acid) (DCPAA) films with dimethyl formamide (DMF) have been used to photofabricate surface relief gratings. The formation of those gratings depends on the self-development time in darkness subsequent to the illumination at a wavelength of 442 nm and is obtained without any chemical treatment or wet processing. The modulation depth of those holographic surface relief gratings and the spatial frequency response of the thin DCPAA-DMF films have been chosen to characterize that self-developing photopolymer system. Those holographic Characteristics are presented in this paper.
Version
Not applicable (or unknown)
Access right on openHSU
Metadata only access