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Chemical and photoelectrochemical instability of amorphous TiO2 layers quantified by spectroscopic ellipsometry

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cris.customurl12208
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cris.virtual.departmentWerkstoffkunde
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dc.contributor.authorKriegel, Herman
dc.contributor.authorKollmann, J.
dc.contributor.authorRaudsepp, Ragle
dc.contributor.authorKlassen, Thomas
dc.contributor.authorSchieda, Mauricio
dc.date.issued2020
dc.descriptionLondon
dc.description.versionNA
dc.identifier.citationEnthalten in: Journal of materials chemistry. - London [u.a.] : RSC, 2013. - Online-Ressource . - Bd. 8.2020, 35, Seite 18173-18179
dc.identifier.doi10.1039/D0TA04878J
dc.identifier.urihttps://openhsu.ub.hsu-hh.de/handle/10.24405/12208
dc.language.isoen
dc.relation.journalJournal of materials chemistry A
dc.relation.orgunitWerkstoffkunde
dc.rights.accessRightsmetadata only access
dc.titleChemical and photoelectrochemical instability of amorphous TiO2 layers quantified by spectroscopic ellipsometry
dc.typeResearch article
dspace.entity.typePublication
hsu.peerReviewed✅
hsu.uniBibliography✅
oaire.citation.endPage18179
oaire.citation.issue35
oaire.citation.startPage18173
oaire.citation.volume8
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